Semiconductor

Electronic products belong to modern daily life, and without them, imagining life is no longer possible. Computers, smartphones, cars, home control devices, medical equipment, and other highly integrated circuits are all based on semiconductor technology.

Semiconductor processing

The market is driven by modern communication tools such as smartphones, tablets, televisions, flat panel displays, or the Internet of Things. Whether it's ion implantation machines, etching or PECVD equipment, we will find high-quality and highly reliable vacuum solutions for you to achieve better performance. We continue to innovate technological solutions that will improve process uptime, output, throughput, and safety certification levels. At the same time, we strive to coordinate and balance often conflicting lower cost of ownership requirements by reducing emissions that are detrimental to the environment, extending product lifespan, and reducing ongoing service costs.

Offset printing

Lithography (i.e. pattern formation on wafers) is a critical step in semiconductor manufacturing processes. Although traditional and even immersion lithography generally do not require a vacuum environment, far ultraviolet (EUV) lithography and electron beam lithography require a vacuum pump. We can help you effectively handle these two applications.

Chemical vapor precipitation

Chemical vapor deposition (CVD) systems have multiple configurations for depositing various types of thin films. The process also operates at different pressure and flow rates, many of which use fluorine-containing dry cleaning processes. All these variable factors mean that you need to consult one of our application engineers to choose the appropriate pump and gas reduction system in order to effectively extend the maintenance interval of our products and prolong the normal operation time of your process.

Etching

Due to the extremely fine feature sizes of many semiconductors, the etching process has become increasingly complex. In addition, the amplification of MEMS devices and 3D structures is increasingly using silicon etching processes for structures with high aspect ratios. Traditionally, etching processes can be grouped into silicon, oxide, and metal categories. Due to the use of more hard masks and high-k materials in today's devices, the boundaries between these categories have become very blurred. Some materials used in today's equipment are able to resist evaporation tenaciously during the etching process, leading to deposition within vacuum components. The current manufacturing process has indeed become more challenging than a few years ago. We closely monitor industry and process changes and keep pace with them through product innovation to achieve better performance.

ion implantation

Ion implantation tools still play an important role in the front-end process. The vacuum challenges associated with ion implantation have not become easier over time, and we recognize the challenges faced when operating vacuum pumps in noisy electronic environments. We know that pumps used on injection tools will require higher immunity and special design features to ensure that the high voltage range of the injection tool does not interfere with the reliability of the pump.